The HRL team achieved the first gallium nitride (GaN) complementary metal-oxide-semiconductor field-effect-transistor technology, establishing superior GaN transistor performance harnessed in an integrated circuit. GaN could become the technology of choice for power conversion circuits currently made in silicon.
HRL Laboratories, LLC, has been selected as a 2017 R&D 100 Finalist with the entry Additively Manufactured High-Temperature Polymer-Derived Ceramics.